RAPDS PROFILES ASSOCIATED TO THE RESISTANCE TO HIGH LIGHT INTENSITY OF POLES
DOI:
https://doi.org/10.29298/rmcf.v3i12.509Keywords:
Abies religiosa (Kunth) Schltdl. et Cham., stomata aperture, stomata, molecular marker, umbraphyla plant, assisted selectionAbstract
Abies religiosa has great potential as urban forest tree, Christmas-tree, bonsai, timber, paper, ceiling, medicinal, and carbon sequestration. However, plantations are not possible without tree covering, because this species is shade tolerant, and their seedlings are susceptible to high intensity light. Nevertheless, A. religiosa shows natural intraspecific variation in resistance to high intensity light. Because of this and because exist interspecific phenotipic variation for resistance to high intensity light. The probability that there is a genetic basis for the intraspecific variation must be high. The aim of this study was to detect RAPD profiles associated with resistance to high intensity light on A. religiosa seedlings. The DNA from 15 resistant and 15 susceptible seedlings to high intensity light were isolated. Two bulked samples were formed and 35 primers were evaluated. From primers with PCR products, a second PCR reaction with DNA from individual seedlings was done. Registered data were: seedling survival to high intensity light, leaf number, stomata aperture, stomata number, and plant height. Correlations between these variables, and RAPDs profiles for each primer were computed. Bands which correlated with all variables were detected. 24 % of the seedlings survived to high intensity light. Stomata width and aperture showed the largest number of correlations. The 1801.92 pb band from primer 5’-CCGGCCTTCC-3’ was correlated with almost all variables. This suggests that survival, height, leaf number, and stomata aperture are genetically controlled variables. Seedling survival to high intensity light is mainly determined by stomata aperture.
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